We have investigated the aging processes in InGaN laser diodes fabricated by metal organic vapor phase epitaxy on low-dislocation-density, high-pressure-grown bulk gallium nitride crystals. The measured threshold current turned out to be a square root function of aging time, indicating the importance of diffusion for device degradation. The differential efficiency, in contrast, was roughly constant during these experiments. From these two observations we can conclude that the main reason for degradation is the diffusion-enhanced increase of nonradiative recombination within the active layer of the laser diode. Additionally, microscopic studies of the degraded structures did not reveal any new dislocations within the active area of the aged diodes, thus identifying point defects as a source of nonradiative processes.
The low-temperature breakdown of the electroluminescence intensity (ELI) of blue/violet InGaN-based light-emitting diodes (LEDs) is shown to be independent of the structural details of the LED active region. Instead, the presence of an electron blocking layer (EBL) plays a decisive role. The authors attribute the ELI collapse to the low-temperature hole-blocking properties of the EBL. However, removing the EBL leads to a much reduced ELI because of a disproportional increase of electron overflow processes, which shows that the presence of an EBL in blue/violet InGaN-based LEDs is still essential. Optimization of the EBL by means of Mg doping is discussed.
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