Numerous RNAs are exported from the nucleus, abnormalities of which lead to cellular complications and diseases. How thousands of circular RNAs (circRNAs) are exported from the nucleus remains elusive. Here, we provide lines of evidence to demonstrate a link between the conserved Exportin 4 (XPO4) and nuclear export of a subset of circRNAs in metazoans. Exonic circRNAs (ecircRNAs) with higher expression levels, larger length, and lower GC content are more sensitive to XPO4 deficiency. Cellular insufficiency of XPO4 leads to nuclear circRNA accumulation, circRNA:DNA (ciR-loop) formation, linear RNA:DNA (liR-loop) buildup, and DNA damage. DDX39 known to modulate circRNA export can resolve ciR-loop, and splicing factors involved in the biogenesis of circRNAs can also affect the levels of ciR-loop. Testis and brain are two organs with high abundance of circRNAs, and insufficient XPO4 levels are detrimental, as Xpo4 heterozygous mice display male infertility and neural phenotypes. Increased levels of ciR-loop, R-loop, and DNA damage along with decreased cell numbers are observed in testis and hippocampus of Xpo4 heterozygotes. This study sheds light on the understandings of mechanism of circRNA export and reveals the significance of efficient nuclear export of circRNAs in cellular physiology.

The chemical mechanical polishing (CMP) of ruthenium (Ru) based barrier layer has been a pivotal process in the manufacture of a novel copper (Cu) interconnect structure. This paper mainly investigated the role of NH4+ in colloidal silica slurries for Ru CMP. The polishing results show that the Ru removal rate increases with the increasing concentration of NH4+. The influence mechanism of NH4+ on removal rate of Ru was investigated by electrochemistry, scanning electron microscope (SEM) and zeta potential. It is revealed that the NH4+ can promote the surface corrosion rate of Ru by forming a water-soluble Ru-NH4 complex with Ru oxide, meanwhile can also result in the neutralization of the zeta potentials of both silica particles and the Ru surface, and thus can lead to the decrease of the electrostatic repulsive force and the increase of the mechanical abrasion intensity between silica particles and Ru surface. Further, the surface quality of the polished Ru wafer and slurry stability were evaluated, and the results show that the addition of an appropriate amount of NH4+ can achieve a low surface roughness of Ru and a high slurry stability.

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We have developed a convenient two-step procedure for the synthesis of 3-ethoxycarbonyl indoles from commercially available materials. The two-step procedure involves the synthesis of 2-aryl-3-hydroxypropenoic acid ester, followed by a catalytic reduction. This method is efficient, simple, and selective.