Dedicated to Professor Horst P. Strunk on the occasion of his 65th birthday PACS 62.20Fe, 61.50Ks, 61.43Dq, 63.20Mt, 61.72Ff, 68.37Hk The deformation mechanisms of silicon {001} surfaces during nanoscratching were found to depend strongly on the loading conditions. Nanoscratches with increasing load were performed at 2 µm/s (low velocity) and 100 µm/s (high velocity). The load-penetration-distance curves acquired during the scratching process at low velocity suggests that two deformation regimes can be defined, an elasto-plastic regime at low loads and a fully plastic regime at high loads. High resolution scanning electron microscopy of the damaged location shows that the residual scratch morphologies are strongly influenced by the scratch velocity and the applied load. Micro-Raman spectroscopy shows that after pressure release, the deformed volume inside the nanoscratch is mainly composed of amorphous silicon and Si-XII at low scratch speeds and of amorphous silicon at high speeds. Transmission electron microscopy shows that Si nanocrystals are embedded in an amorphous matrix at low speeds, whereas at high speeds the transformed zone is completely amorphous. Furthermore, the extend of the transformed zone is almost independent of the scratching speed and is delimited by a dislocation rich area that extends about as deep as the contact radius into the surface. To explain the observed phase and defect distribution a contact mechanics based decompression model that takes into account the load, the velocity, the materials properties and the contact radius in scratching is proposed. It shows that the decompression rate is higher at low penetration depth, which is consistent with the observation of amorphous silicon in this case. The stress field under the tip is computed using an elastic contact mechanics model based on Hertz's theory. The model explains the observed shape of the transformed zone and suggests that during load increase, phase transformation takes place prior to dislocation nucleation.
SummaryCryo-FIB-nanotomography is a novel high-resolution 3D-microscopy technique, which opens new possibilities for the quantitative microstructural analysis of complex suspensions. In this paper, we describe the microstructural changes associated with dissolution and precipitation processes occurring in a fresh cement paste, which has high alumina and sulphate contents. During the first 6 min, precipitation of ettringite leads to a general decrease of the particle size distribution. In the unhydrated cement paste almost no particles smaller than 500 nm are present, whereas after 6 min this size class already represents 9 vol%. The precipitation of ettringite also leads to a significant increase of the particle number density from 0.294 * 10 9 /mm 3 at t 0min to 20.55 * 10 9 /mm 3 at t 6min . Correspondingly the surface area increases from 0.75 m 2 /g at t 0min to 2.13 m 2 /g at t 6min . The small ettringite particles tend to form agglomerates, which strongly influence the rheological properties. The particular strength of cryo-FIB-nt is the potential to quantify particle structures in suspension and thereby also to describe higher-order topological features such as the particle-particle interfaces, which is important for the study of agglomeration processes.
We present a detailed study of the remanent magnetic domain configurations in demagnetized polycrystalline ferromagnetic thin film wedges of cobalt and Permalloy deposited on prepatterned silicon substrates with micrometer-sized square plateaus, which have a height of 125 nm, using photoemission electron microscopy. We have observed the continuous evolution of the magnetic domain states in the square ferromagnetic elements on top of the plateaus as a function of film thickness. At high film thickness we observe the Landau state, which is the expected lowest energy state, but at lower thickness we see a variety of metastable states which are trapped as a result of local pinning. In a small thickness range below 10 nm, the square elements contain 360°walls and small domains which are likely to be a result of local effects such as magnetocrystalline anisotropy and edge roughness. We are able to simultaneously observe the development of the magnetic domains in the continuous polycrystalline film surrounding the plateaus and, rather than the expected large domains, we observe at intermediate film thickness a significant modification of the domain configuration to small domains. Here the roughness of the silicon substrate surrounding the plateaus, which is due to the reactive ion etching process used to prepare the prepatterned substrates, gives rise to local stray fields in the ferromagnetic film which play an important role in determining the resulting domain structure.
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