We report on a new periodically poled lithium niobate grating design with a continuous grating-period change (fan-out). We observed 350cm(-1) (80 nm at 1.5microm) of complete spectral coverage at a constant temperature in a cw optical parametric oscillator. Complete spectral coverage is demonstrated by measurement of an absorption band of CO(2) .

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A broadly tunable femtosecond optical parametric oscillator (OPO) based on KTiOPO(4) that is externally pumped by a self-mode-locked Ti:sapphire laser is described. Continuous tuning is demonstrated from 1.22 to 1.37 microm in the signal branch and from 1.82 to 2.15 microm in the idler branch by using one set of OPO optics. The potential tuning range of the OPO is from 1.0 to 2.75 microm and requires three sets of mirrors and two crystals. Without prisms in the OPO cavity, 340 mW (475 mW) of chirped-pulse power is generated in the signal (idler) branch for 2.5 W of pump power. The total conversion efficiency as measured by the pump depletion is 55%. With prisms in the cavity, pulses of 135 fs are generated, which can be shortened to 75 fs by increasing the output coupling.

We report a fiber laser design that is capable of producing switchable radially and azimuthally polarized beams at 1.6 μm. A c-cut calcite crystal within a three-lens telescope is inserted in the cavity of an erbium doped fiber laser design. Due to the axially symmetric birefringence of the calcite crystal, radially, and azimuthally polarized modes have spatially separated foci in the cavity. Switching between the radially and azimuthally polarized outputs can be achieved by simply translating one of the lenses of the telescope. Output power more than 135 mW for both polarizations has been obtained.

We report the optical characterization of a metal wiregrid micropolarizer array for IR imaging polarimetry. The micropolarizers are designed for operation in the 1.5-5.0 microm band with a specially designed thin SiO(2) layer between the silicon substrate and the wiregrids to improve the performance at the shorter wavelengths. Deep-UV projection lithography is used to fabricate 140-nm-deep wiregrids with a 400 nm period. The extinction ratio and the transmission coefficient are measured with a tunable IR laser. A TM transmission coefficient greater than 70% with an extinction ratio greater than 10(4) is achieved for the midwave-IR region while maintaining an extinction ratio better than 10(2) for the near-IR region above 1.5 microm.