Memristor crossbar arrays can compose the efficient hardware for artificial intelligent applications. However, the requirements for a linear and symmetric synaptic weight update and low cycle‐to‐cycle (C2C) and device‐to‐device variability as well as the sneak‐path current issue have been delaying its further development. This study reports on a thin‐film amorphous oxide‐based 4×4 1‐transistor 1‐memristor (1T1M) crossbar. The a‐IGZO crossbar is built on a flexible polyimide substrate, enabling IoT and wearable applications. In the novel framework, the thin‐film transistor and memristor are fabricated at the same level, with the same processing steps and sharing the same materials for all layers. The 1T1M cells show linear and symmetrical plasticity characteristic with low C2C variability. The memristor performs like an analog dot product engine and vector–matrix multiplications in the 4×4 crossbars is demonstrated experimentally, in which the sneak‐path current issue is successfully suppressed, resulting in a proof‐of‐concept for a cost‐effective, flexible artificial neural networks hardware.
ZnO thin film transistors (ZnO-TFT) have been fabricated by rf magnetron sputtering at room temperature with a bottom-gate configuration. The ZnO-TFT operates in the enhancement mode with a threshold voltage of 21 V, a field effect mobility of 20 cm 2 /Vs, a gate voltage swing of 1.24 V/decade and an on/off ratio of 2×10 5 . The ZnO-TFT present an average optical transmission (including the glass substrate) of 80 % in the visible part of the spectrum. The combination of transparency, high channel mobility and room temperature processing makes the ZnO-TFT a very promising low cost optoelectronic device for the next generation of invisible and flexible electronics. Moreover, the processing technology used to fabricate this device is relatively simple and it is compatible with inexpensive plastic/flexible substrate technology. Key words: Thin-film transistors, rf magnetron sputtering, transparent electronics, optoelectronic devices 225 N.H. Nickel and E. Terukov (eds.), Zinc Oxide -A Material for Micro-and Optoelectronic Applications, 225-238.
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