A platinum catalyzed hydrosilation reaction between 3,4,-dichiorobutene and the hydrogen-terminated (100) Si surface was used to bond dichlorobutane molecules to silicon wafers treated with dilute HF acid. In situ infrared, x-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectroscopy were used to characterize the modified silicon surfaces. The results from this investigation indicate that 3,4,-dichlorobutene reacts with surface silicon hydride groups to yield 3,4,-dichlorobutane, which bonds to the surface via Si-C bonds. This work demonstrates that organic molecules can be selectively patterned onto hydrogen-terminated silicon wafers using standard microelectronic patterning methods.
IniroductionThe use of aqueous HF to remove the native and deposited oxides from silicon is a common process in semiconductor manufacturing and micromachining technology.
The molecular size dependence of primary fragmentation is studied for a series of β -naphthyl esters having alkyl chain lengths from C2 to C18. The esters are vaporized at a known ftemperature and ionized by coherent vacuum ultraviolet radiation at 10.5 eV. The photoionization wavelength is energetic enough to cause both metastable and nonmetastable primary fragmentation to m / z 144, but not energetic enough to cause secondary fragmentation to m / z 115 or 116. Under these conditions, the ratio of the nonmetastable-to-metastable daughter ion current, D/m D (') is expected to give a rough indication of the average parent ion dissociation rate. The D / m D ratio decreases with increasing molecular size, but not as quickly as expected by simple RRK theory. This behavior along with temperature dependence studies suggests that the internal energy required for dissociation is provided in substantial part by both the initial thermal internal energy and the energy imparted by the photoionization step. The role of thermal energy in the dissociation of large ions is discussed.
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