A novel atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) approach toward the growth of conventional polymer layers is characterized and interpreted. A set of three methacrylate monomers (methyl, butyl, and glycidyl methacrylate) were investigated using ultrashort plasma discharges (ca. 100 ns) pulsed at various frequencies, covering a range of duty cycle from 0.1% to 0.000 316%. An unprecedented weight-average molar mass of 94 000 g mol −1 coupled to an outstanding thin film conformality and an excellent chemical functionalities retention was achieved for the best deposition conditions. Insights into the growth mechanisms in AP-PiCVD and their dependence on the monomer's intrinsic properties are provided.

A simple, efficient and scalable method for the atmospheric pressure plasma initiated chemical vapor deposition of conventional polymer is demonstrated. Ultra‐short square pulse dielectric barrier discharge, which allows high deposition rates even for plasma duty cycle as low as 0.01%, is used to deposit a glycidyl methacrylate (GMA) polymer layer. The polymer structure of the thin films is evidenced by matrix‐assisted laser desorption/ionization high‐resolution mass spectrometry. Polymer molecular weights up to 30 000 g mol−1 are found by size exclusion chromatography (SEC), highlighting the suitability of the plasma initiated CVD method for the deposition of polymer layers.

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Transparent anti-fogging and self-cleaning coatings are of great interest for many applications, including solar panels, windshields and displays or lenses to be used in humid environments. In this paper, we report on the simultaneous synthesis, at atmospheric pressure, of anatase TiO2 nanoparticles and low-temperature, high-rate deposition of anatase TiO2/SiO2 nanocomposite coatings. These coatings exhibit durable super-hydrophilic and photocatalytic properties. The strategy followed relies on concomitant and separated injections of titania, i.e. titanium isopropoxide, and silica, i.e. hexamethyldisiloxane, precursors in the stream of a blown-arc discharge to form transparent anti-fogging and self-cleaning anatase TiO2/SiO2 nanocomposite coatings on polymer substrates.

A comprehensive mass-spectrometry study of a set of poly(alkyl acrylate) layers synthesized by atmospheric pressure plasma-initiated chemical vapor deposition (AP-PiCVD) is provided. High-resolution mass spectrometry investigations demonstrate that exposure of the alkyl acrylate monomers to ultra-short and lowfrequency plasma pulses produces a defined number of radical and neutral fragments, which can play both the roles of polymerization initiation or termination groups. Further inquiries illustrate the competition between a conventional free-radical polymerization pathway and plasma-polymerization. On the basis of the massspectrometry observations and the bond dissociation energies calculated by density functional theory, guidelines are made to select appropriate AP-PiCVD monomers. K E Y W O R D Satmospheric-plasma CVD, conventional polymerization, high-resolution mass-spectrometry, nanopulsed discharge, polymerization mechanisms 1 | INTRODUCTION In many synthesis reactions, plasma provides a convenient alternative to thermal heating [1] or chemical reactants. [2] Noticeably, plasma-enhanced chemical vapor deposition (PECVD) processes can lead to the simultaneous lowtemperature synthesis and deposition of crystalline metal oxide thin films on polymer substrates [3] or ensure the "polymerization" of chemically non-polymerizable precursors. [4,5] The PECVD of many inorganic and organic materials has already been reported and the fine-tuning of the PECVD parameters, e.g., the composition of the plasma gas and the plasma excitation mode, can trigger a wide range of reactions, including the reduction of metal salts, [6] the oxidative polymerization of aromatic compounds, [2] and the free-radical polymerization of vinylene monomers. [7] Nevertheless, due to the intrinsic nature of plasmas, consisting of many reactive species with a wide energy range, a nonnegligible number of side reactions occurs. [2] As a consequence to the non-specificity of plasma-induced reactions and the sensitivity of the organic bonds, the chemical structure of monomers is only partially retained and the resulting PECVD This is an open access article under the terms of the Creative Commons Attribution-NonCommercial-NoDerivs License, which permits use and distribution in any medium, provided the original work is properly cited, the use is non-commercial and no modifications or adaptations are made.

For the first time, the plasma‐assisted inkjet printing of metal‐organic decomposition (MOD) inks is demonstrated to provide an easily up‐scalable method toward the deposition of highly conductive silver features on paper. Atmospheric plasma sintering methods provide a fast and effective alternative to thermal treatment. This high‐speed, room‐temperature approach ensures the immediate conversion of the MOD inks after printing and thus overcomes wetting issues typically encountered in porous substrates—a mechanical solution to a chemical problem.

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An innovative atmospheric pressure chemical vapor deposition method toward the deposition of polymeric layers has been developed. This latter involves the use of a nanopulsed plasma discharge to initiate the free-radical polymerization of an allyl monomer containing phosphorus (diethylallylphosphate, DEAP) at atmospheric pressure. The polymeric structure of the film is evidence by mass spectrometry. The method, highly suitable for the treatment of natural biopolymer substrate, has been carried out on cotton textile to perform the deposition of an efficient and conformal protective coating.