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A key need for the development and testing of models suitable for chemically active, low pressure plasmas is detailed comparisons between model predictions and experimental measurements. In this paper, a two-dimensional, axisymmetric fluid model of an inductively coupled plasma is described, and model predictions are compared to the experimental measurements of P. A. Miller, G. A. Hebner, K. E. Greenberg, P. D. Pochan, and B. P. Aragon [J. Res. Natl. Inst. Stand. Technol. 100, 427 (1995)] of electron density, electron temperature, and plasma potential. Comparisons between model predictions and experimental measurements were made in argon and chlorine discharges. Qualitative to semiquantitative agreement between the model predictions and experimental diagnostics was observed, suggesting that assumptions made in the model are reasonably accurate.

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The scaling laws that control the efficiency of converting ground-based HF power to ELF power by using modulation of the polar electrojet current is discussed. The analysis is based on kinetic calculations of the modification of the ionospheric conductivity by HF waves in conjunction with the experimental results reported from the Tromso Max Planck and the Alaska high power auroral simulation (HIPAS) facilities. It is shown that the efficiency can be increased by more than a factor of 10 4 by (1) using phasing to sweep the antenna beam over an area spanned by a maximum tilt of 35 ø, on a time scale faster than the cooling rate at the heating altitude (<100/•s) and (2) localization of the heating at the E region (90-100 km) where electron runaway can be induced resulting in substantial modification of the Pederson conductivity.

A two-dimensional (r,z) fluid model i s used to study plasma transport in inductively coupled plasmas (IcPs). Electron heating from external t coils driven at 2 MHz is calculated self-consistently by solving for thetimeaveraged RF electric field.Radial plasma uniformity h a s been studied in both high (R/L = 2.5) and low (R/L = 1) aspect ratio ICP reactors driven with external planar or cylindrical coils. The effect of neutral gas pressure on plasma uniformity is presented for Ar discharges ai 5 and 20 mTorr. The location of extemal coils and corresponding power deposition profile is predicted to have little effect on uniformity except at higher pressure ( 2 20 mTorr) and for large aspect ratios. Planar coils appear superior to cylindrical coils for achieving relatively consistent uniformity over a wide range of pressures and reactor aspect ratios.

JWL++ is a simple Reactive Flow model that includes time‐dependent reaction in prompt detonation. It consists of a Murnahan unreacted equation of state, a JWL reacted EOS, a mixer for the two EOS's and a single‐time‐constant exponential rate. The mixing can be done by four ways, using either pressure or pressure plus artificial viscosity in the rate, and also using either an analytic function or a pressure equilibrator. The model reproduces the Size Effect and detonation front curvature. Detonation failure can also be induced. JWL++ propagates also through an arbitrary geometry in 3‐D without the need for pre‐run program burn calculations. It is slower than a JWL/program “Burn” but faster than “Ignition & Growth”.

A self-consistent two-dimensional radio frequency inductively coupled glow discharge model has been developed in cylindrical coordinates using a fluid model. The objective of the study is to provide insight into charged species dynamics and investigate their effects on plasma process for a methane discharge. The model includes continuity and energy equations for electrons and continuity, momentum and energy equations for positive and negative ions. An electromagnetic model that considers the electric field due to the space charge within the plasma and due to inductive power coupling is also incorporated. For an inductively coupled methane discharge we expect to find higher fluxes of ions and radicals to the cathode, and hence a higher deposition/etch rate for a high-density plasma. The independent control of ion energy to the cathode in an inductively coupled discharge will facilitate control on film deposition/etch rate and uniformity on the wafer. Swarm data as a function of the electron energy are provided as input to the model. The model predicts the electron density, ion density and their fluxes and energies to the cathode. The radical and neutral densities in the discharge are calculated using a gas phase chemistry model. The diamond-like-carbon thin-film deposition/etch rate is predicted using a surface chemistry model. The gas phase chemistry model considers the diffusion of radicals and neutrals along with creation and loss terms. The surface deposition/etching process involves adsorption-desorption, adsorption layer reaction, ion stitching, direct ion incorporation and carbon sputtering.