The deposition of SnO 2 using a 120 W high power diode laser (HPDL) on both fused silica and sodalime-silica glass has been successfully demonstrated. Deposition on both glass substrates was carried out with laser power densities of 650-1600 W cm -2 and at rates of 420-1550 mm min -1 . The thickness of the deposited layers was typically around 250 µm. The maximum theoretical coverage rate that it may be possible to achieve using the HPDL was calculated as being 3.72 m 2 h -1 . Owing to the wettability characteristics of Sn, it proved impossible to deposit the metal on either glass substrate.Evidence of solidified microstructures was observed, with the microstructures differing considerably across the same deposited track. These differences were attributed to variations in the solidification rate, R, and the thermal gradient, G. Adhesion of the SnO 2 with the soda-lime-silica glass was found to be due to mechanical bonding. The adhesion of the SnO 2 with the fused silica was seen to the result of a chemical bond arising from an interface region between the SnO 2 and the fused silica glass substrate. This interface region was found to be comprised of mainly Si and rich with Sn 3 O 4 .
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.