This paper aims to analyze the mechanism of power absorption and to reveal, both experimentally and numerically, the basic factors determining the ability of plasma to absorb RF power. This is done by determining the plasma equivalent resistance value under different conditions in a low-pressure RF inductive discharge such as different antenna shape, working gas pressure, electron density, operating frequency and geometrical dimensions of the plasma source. Experimental and numerical results show that the plasma equivalent resistance changes non-monotonously with an increase in electron density, increases with an increase in neutral gas pressure, and that the maximum plasma equivalent resistance shifts toward higher electron densities when the operating frequency is increased.
The present paper deals with the experimental and numerical study of radio-frequency (RF) lowpressure discharge having both inductive and capacitive or DC channels. Two discharge schemes are considered. In the first case the inductive and capacitive channels are powered by two independent RF power sources. In the second case the inductor and capacitor plates, being the main parts of inductive and capacitive channels, are connected in parallel to one RF power source. The properties of the mentioned discharges are compared with that of pure inductive RF discharge. It is shown that the presence of the capacitive component leads to changes of the fraction of RF power coupled through the inductive channel. This manifests with a reduction of the RF source power value, at which the transition from E-to H-mode takes place, and with the disappearance of hysteresis.
Present paper is aimed to reveal experimentally and theoretically the influence of magnetic field strength, antenna shape, pressure, operating frequency and geometrical size of plasma sources on the ability of plasma to absorb the RF power characterized by the equivalent plasma resistance for the case of low pressure RF inductive discharge located in the external magnetic field. The distinguishing feature of the present paper is the consideration of the antennas that generate not only current but charge on the external surface of plasma sources. It is shown that in the limited plasma source two linked waves can be excited. In case of antennas generating only azimuthal current the waves can be attributed as helicon and TG waves. In the case of an antenna with the longitudinal current there is a surface charge on the side surface of the plasma source, which gives rise to a significant increase of the longitudinal and radial components of the RF electric field as compared with the case of the azimuthal antenna current.
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