Copper oxide is considered as an alternative electrode material for supercapacitors due to its low cost, chemical stability and high theoretical specific capacitance. In the present work, nanostructured copper oxide (CuO) films are prepared by radio-frequency (RF) magnetron sputtering, and the influence of the substrate temperature on the microstructure and supercapacitive properties was studied. The copper oxide films prepared at 350 °C exhibit a predominant (1¯11) orientation corresponding to the monoclinic Cu(II)O phase with a crystallite size of 24 nm. The surface of the film consists of uniformly distributed oval-like grains providing a high surface roughness of 45 nm. The films exhibit an optical bandgap of 1.68 ± 0.01 eV and an electrical conductivity of 0.4 S cm−1 at room temperature. The as-prepared CuO films deliver a discharge specific capacitance of 387 mF cm−2 (375 F g−1) at a current density of 1 mA cm−2 with excellent cyclic capacitance retention of 95% (367 mF cm−2) even after 1000 cycles. Hence, these films are potential electrodes for micro-supercapacitors.
Nanocrystalline V 2 O 5 thin films were deposited by dc-magnetron sputtering at various substrate temperatures keeping O 2 to Ar ratio at 1:8. The microstructural features were studied by XRD and Raman measurements while the surface topography and grain size of the films by AFM. The films deposited at 250 ˚C exhibited predominant (001) orientation representing the orthorhombic crystal structure with Pmmn space group. The observation of well resolved vanadyle mode at 993 cm-1 and very strong vibrational mode at 142cm-1 in Raman spectrum confirms the formation of layered like structure. The surface of the film is comprised of nanocrystallites with an average grain size of 32 nm and surface roughness of 14 nm. The V 2 O 5 thin films deposited on Ni substrates exhibited good electrochemical performance with high specific capacitance of 238 F/g current density of 1 mAcm-2 with good cycling stability.
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