We have investigated defect generation in soda-lime silicate and iron-doped soda-lime silicate glasses by excimer laser irradiation in order to apply coloration due to radiation-induced defects as a coloring technique for practical glass products. The laser irradiation generated various kinds of defects, i.e., non-bridging oxygen hole centers (NBOHCs), E' centers, and trapped electron centers, as does x-ray and γ-ray irradiation. The amounts of generated NBOHCs, monitored by the absorption intensity, increased at first with the irradiation time for both the ArF and XeF lasers, and eventually became saturated. The saturated values for the ArF laser irradiation were almost the same regardless of the laser intensity, whereas those for the XeF laser irradiation were dependent on the intensity; a higher intensity generated a larger amount of NBOHCs. From the comparison of the energies of the photon and the absorption edge of the soda-lime silicate glasses, the defect generation reactions were expected to be one-photon and two-photon processes for the ArF and XeF lasers, respectively. In order to explain the defect generation behavior, we used a simple kinetic model in which the NBOHCs are reversibly generated and annihilated through the photo-reaction. The model includes a stretched exponential function, which is often observed for reactions occurring in amorphous materials. The dependences of the amounts of the generated NBOHCs on the irradiation time and intensity of the laser pulses derived from the model were consistent with the experimental results.
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