Developing a suitable production method for three-dimensional periodic nanostructures with high aspect ratios is a subject of growing interest. For mass production, Talbot lithography offers many advantages. However, one disadvantage is that the minimum period of the light intensity distribution is limited by the period of the diffraction grating used. To enhance the aspect ratio of fabricated nanostructures, in the present study we focus on multiwave interference between diffracted waves created using the Talbot effect. We propose a unique exposure method to generate multi-wave interference between adjacent diffraction orders by controlling the angle of incidence of an ultraviolet (UV) light source. Using finitedifference time-domain simulations, we obtain fringe patterns with a sub-wavelength period using a one-dimensional periodic grating mask. Moreover, we demonstrate the practical application of this approach by using UV lithography to fabricate sub-wavelength periodic structures with an aspect ratio of 30 in millimeter-scale areas, indicating its suitability for mass production.
Recently, there has been considerable interest in mass production technology of metal three-dimensional periodic nanostructures. For mass production, photolithography using diffraction phenomenon is well suited expect the disadvantage that it is difficult to fabricate the metal structures. Therefore, this paper reports for the first time a fabrication of the metal three-dimensional periodic nanostructures, by the diffraction-based lithography using metal ion-containing photoresists. In this report, Ag was used as a metal material to fabricate the structures. An examination of Ag + concentration shows that for Ag + equal to 0.28% or less, Ag nanoparticles are not formed on the photoresist. Under these conditions, it is found that the optimum exposure for fabricating the structures is 400 mJ/cm 2 .
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