Mixed-base-stabilised chloroborylenes are easily accessed by twofold reduction of a cyclic (alkyl)(amino)carbene-supported trichloroborane in the presence of a second Lewis base, thus enabling fine-tuning of the electronic properties of the electron-rich borylene centre.

The parent borylene (CAAC)(Me3P)BH, 1 (CAAC=cyclic alkyl(amino)carbene), acts both as a Lewis base and one‐electron reducing agent towards group 13 trichlorides (ECl3, E=B, Al, Ga, In), yielding the adducts 1‐ECl3 and increasing proportions of the radical cation [1]•+ for the heavier group 13 analogues. With boron trihalides (BX3, X=F, Cl, Br, I) 1 undergoes sequential adduct formation and halide abstraction reactions to yield borylboronium cations and shows an increasing tendency towards redox processes for the heavier halides. Calculations confirm that 1 acts as a strong Lewis base towards EX3 and show a marked increase in the B−E bond dissociation energies down both group 13 and the halide group.

We report a detailed computational and experimental study of the fixation and reductive coupling of dinitrogen with low-valent boron compounds. Consistent with our mechanistic findings, the selectivity toward nitrogen fixation or coupling can be controlled through either steric bulk or the reaction conditions, allowing for the on-demand synthesis of nitrogen chains. The electronic structure and intriguing magnetic properties of intermediates and products of the reaction of dinitrogen with borylenes are also elucidated using high-level computational approaches.

The N‐heterocyclic silylene [{Fe(η5‐C5H4‐NDipp)2}Si] (1DippSi, Dipp=2,6‐diisopropylphenyl) shows an excellent combination of pronounced thermal stability and high reactivity towards small molecules. It reacts readily with CO2 and N2O, respectively affording (1DippSiO2)2C and (1DippSiO)2 as follow‐up products of the silanone 1DippSiO. Its reactions with H2O, NH3, and FcPH2 (Fc=ferrocenyl) furnish the respective oxidative addition products 1DippSi(H)X (X=OH, NH2, PHFc). Its reaction with H3BNH3 unexpectedly results in B−H, instead of N−H, bond activation, affording 1DippSi(H)(BH2NH3). DFT results suggest that dramatically different mechanisms are operative for these H−X insertions.

Trichlorosilane is the key intermediate for the large-scale production of polycrystalline silicon in the Siemens and Union Carbide processes. Both processes, however, are highly inefficient, and over two thirds of the trichlorosilane employed is converted to unwanted silicon tetrachloride accumulating in millions of tons per year on a global scale. In this combined experimental and theoretical study we report an energetically and environmentally benign synthetic protocol for the highly selective conversion of SiCl 4 to HSiCl 3 using organohydridosilanes as recyclable hydrogen transfer reagents in combination with onium chlorides as efficient catalysts. We put the same protocol to further use demonstrating the quantitative conversion of higher oligosilane residues, which form as another unwanted and potentially hazardous byproduct of Siemens processes, to HSiCl 3 in a low-temperature recycling step.