Thin-film growth of metallic platinum by aerosol-assisted chemical vapor deposition (AA-CVD) is an attractive alternative to the application of vacuum-based methods. This versatile and scalable technique allows gas phase deposition of thin-films from nebulized precursor solutions in a simple, open setup at moderate temperatures between 400 and 600 C. We discuss the film growth mechanisms on silicon and zirconia substrates in terms of microstructure, surface coverage, sheet resistance, and thermal stability. Furthermore, the positive influence of Pt thin-films deposited by AA-CVD on the area specific resistance (ASR) of symmetric Pt/YSZ/Pt cells in air is presented.[*] Dr.
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