Since the 1940s, infrared (IR) detection and imaging at wavelengths in the two atmospheric windows of 3 to 5 and 8 to 14 μm has been extensively researched. Through several generations, these detectors have undergone considerable developments and have found use in various applications in different fields including military, space science, medicine and engineering. For the most recently proposed generation, these detectors are required to achieve high-speed detection with spectral and polarization selectivity while operating at room temperature. Antenna coupled IR detectors appear to be the most promising candidate to achieve these requirements and has received substantial attention from research in recent years. This paper sets out to present a review of the antenna coupled IR detector family, to explore the main concepts behind the detectors as well as outline their critical and challenging design considerations. In this context, the design of both elements, the antenna and the sensor, will be presented individually followed by the challenging techniques in the impedance matching between both elements. Some hands-on fabrication techniques will then be explored. Finally, a discussion on the coupled IR detector is presented with the aim of providing some useful insights into promising future work.

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The fabrication process of a microparabolic reflector using isotropic xenon difluoride XeF 2 etching technique is presented and analysed through this work for developing infrared antenna-coupled detectors. Although many parametric studies described the behaviour of this process in the literature, the non-linearity of the process and its dramatic dependency on the pattern definition result in great difficulties when adopting the process for developing a particular structure. The main focus of this work is, therefore, to present a detailed etching analysis as dictated in the proposed design providing the proper etching recipe according to the proposed structure design and its associated masking pattern. Deep insights into the process have been highlighted suggesting the necessity of the process assessment in terms of evaluating the threedimensional etched volume rather than the etched depth. This will potentially solve the non-linearity behaviour and the pattern dependency problem. The optimum etching recipe yields approximately a total volume of 0.354 mm 3 through the proper patterning mask. The resultant parabolic cavities have 75 and 13 mm in their diameter and depth, respectively, as required for the proposed structure. The integration of a microparabolic reflector with such detectors will potentially enhance the specific detectivity of these detectors.

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