A two dimensional numerical model of an optically gated GaAs MESFET with non uniform channel doping has been developed. This is done to characterize the device as a photo detector. First photo induced voltage (V op) at the Schottky gate is calculated for estimating the channel profile. Then Poisson's equation for the device is solved numerically under dark and illumination condition. The paper aims at developing the MESFET 2-D model under illumination using Monte Carlo Finite Difference method. The results discuss about the optical potential developed in the device, variation of channel potential under different biasing and illumination and also about electric fields along X and Y directions. The Cgs under different illumination is also calculated. It has been observed from the results that the characteristics of the device are strongly influenced by the incident optical illumination.
In this paper we report effect of optical illumination on Silicon MOSFET. The MOSFET has been studied in respect of current voltage, transconductance admittance and scattering parameters. Gain analysis of the Silicon MOSFET is done in dark and under optical illumination. The device is fabricated using ATHENA™ process simulator and the device simulation is performed using ATLAS™ from SILVACO international. The simulation results indicate potential of MOSFET as optically sensitive structure which can be used for increase in data transmission/reception rates, reduction of interconnect delays, elimination of clock skew, or as a photodetector for optoelectronic applications at low and radio frequency.
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