The polysilicon nanofilms have significant piezoresistive characteristics. In this paper, an analysis of tunneling piezoresistive effect of p-type polysilicon nanofilms is presented based on the experimental data. The analysis results show that the tunneling piezoresistive effect is much remarkable than piezoresistive effect of neutral region, and the former is about 1.3 to 1.5 times of the latter. The higher is doping concentration, the more remarkable tunneling piezoresistive effect is. This advantage can be utilized to improve the temperature characteristics of polysilicon piezoresistive sensor.
The gauge factor and nonlinearity of 80nm polysilicon nanofilms with different doping concentration were tested. The experimental results show that, from 8.1×1018cm-3 to 2.0×1020cm-3, the gauge factors first increase then decrease, which like the common polysilicon films (thickness is larger than 100nm). From 2.0×1020cm-3 to 7.1×1020cm-3, the gauge factors do not change with doping concentration almost, which can be explained by tunneling piezoresistive theory. When doping concentration is low than 4.1×1019cm-3, the nonlinearities are big, and the nonlinearities become small when doping concentration is high than 4.1×1019cm-3. The nonlinearity is related to the occupied condition of trapping states in grain boundary. The longitudinal gauge factor and nonlinearity are smaller than transverse ones. Take the gauge factor and nonlinearity both into consideration, the optimal doping concentration should be 4.1×1019cm-3. The conclusions are very useful for design and fabrication of polysilicon nanofilms piezoresistive sensor.
Single event transient of a PMOS using strained Silicon-Germanium in a sub-100nm bulk process is studied by 3D TCAD simulation. The impact of bias voltage, temperature, LET, and struck position on SET is considered. Our simulation results demonstrate that bias voltage in the range 0.8 to 1.2V greatly influence the amplitude of SET current. Temperature has a stronger influence on a SiGe channel PMOS than a Si-channel PMOS. Both SET current duration and total collection charge increase as LET increases, and SET current duration and total collection of a SiGe channel PMOS are larger than that of Si channel PMOS. These simulation results are beneficial to the space application of SiGe circuits.
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