The generation of nanostructures with arbitrary shapes and well-defined chemical composition is still a challenge and targets the core of the fast-growing field of nanotechnology. One approach is the maskless nanofabrication technique of electron-beam-induced deposition (EBID). Up to now, the purity of these EBID structures has been rather poor. Here we demonstrate that by performing the EBID process solely under ultrahigh vacuum conditions, the lithographic generation of iron nanostructures on Si(100) with an unprecedented purity of higher than 95% is possible. One particular new aspect is the formation of EBID deposits with reduced size in a strain-induced diffusive process, resulting in deposits significantly smaller than 10 nm.

Beam me up: A novel two‐step process allows iron nanostructures to be generated locally on SiOx/Si at 300 K. The surface is first locally activated by an electron beam. Then the activated structures are exposed to [Fe(CO)5], which decomposes and grows autocatalytically to give pure Fe nanocrystals.

Upon exposure to Fe(CO)(5), the formation of pure cubic Fe nanocrystals with dimensions up to ~75 nm is reported on ultra-thin SiO(x) films (thickness ≈ 0.5 nm) on Si(001), which have been prepared in situ under UHV conditions. The active centers for initial decomposition of Fe(CO)(5) resulting in the growth of the Fe clusters are proposed to be SiO sites. After nucleation at these sites, further crystal growth is observed due to autocatalytic dissociation of Fe(CO)(5) at room temperature. The density of the Fe clusters can be increased by irradiating the surface with a focused electron beam (15 keV) prior to gas exposure. The formation of the active SiO sites upon electron irradiation is attributed to oxygen desorption via the Knotek-Feibelman mechanism.

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We explore the electron-beam-induced deposition (EBID) of iron pentacarbonyl, Fe(CO)5, in ultrahigh vacuum (UHV) on clean and modified Rh(110) surfaces by scanning electron microscopy (SEM), scanning Auger microscopy (SAM), and local Auger electron spectroscopy (AES). In EBID a highly focused electron beam is used to locally decompose the iron pentacarbonyl precursor molecules with the goal to generate pure iron nanostructures. It is demonstrated that the selectivity of the process strongly depends on the surface properties. On a perfect, clean Rh(110) surface almost no selectivity is observed; i.e., deposition of Fe is found on irradiated and nonirradiated surface regions due to catalytic decomposition of the Fe(CO)5. However, on a structurally nonperfect Rh(110) surface and on a Ti-precovered Rh(110) surface high selectivity is found; i.e., Fe deposits are primarily formed in irradiated regions. The role of catalytic and autocatalytic growth of iron on clean Rh respective iron deposits is discussed. The purity of the Fe deposits was always very high (>88%). It is demonstrated that the deposited Fe structures can be selectively oxidized to iron oxide by exposure to oxygen. Furthermore, attempts to write Fe line deposits were also successful, and line diameters smaller than 25 nm could be achieved.