The (N,N-dialkylaminoethyl)cyclopentadienyl group 13 element dichlorides 3 and 4 of the typewith the respective group 13 element trichlorides. The reaction of 3 with LiAlH 4 afforded the cyclopentadienylaluminum dihydride [(Me 2 NCH 2 CH 2 )C 5 H 4 ]AlH 2 (5) in nearly quantitative yield. Treatment of the organogallium dichlorides [ 5), i-Pr (7)} in good yields. The reaction of 6 with LiGaH 4 resulted in the formation of the organogallium dihydride [(Me 2 NCH 2 CH 2 )C 5 H 4 ]GaH 2 (8). The novel compounds 3-5, 7, and 8 were characterized by elemental analysis, NMR spectroscopy, mass spectrometry, and X-ray crystallography. In the solid state and also in solution, all compounds feature a monomeric structure with an intramolecularly coordinated dialkylamino group. The coordinative and electronic saturation of the metal center in these compounds leads to a drastically decreased reactivity toward moisture and air in comparison to nondonorstabilized Cp-group 13 element compounds. The dynamic behavior observed in solution is based on fast haptotropic shifts in a "windshield-wiper" type process. Sufficient volatility makes the organodihydrido compounds 5 and 8 suitable precursors for the deposition of aluminum and gallium, respectively, in the MOCVD process. Ex-situ characterization with sputter auger electron spectroscopy (SAES) provides information about the chemical composition of the aluminum and gallium layers. Irradiation of 5 and 8 in solution is followed by decomposition into the respective metal and into the hydrogen-functionalized ligand [C 5 H 5 (CH 2 CH 2 NMe 2 )].
Several new gallium compounds containing the [2-(N,N-dimethylamino)ethyl]cyclopentadienyl ligand (Cp N ) are described. Reaction of the respective element halide with Cp N K 1 leads to the compounds 2-6 of the type [2-(Me 2 NCH 2 CH 2 )C 5 H 4 ]GaX 2 [2: X ) Cl; 3: X ) Br; 4: X ) I; 5: X ) CH 3 ; 6: X ) H]. Each compund was characterized by 1 H and 13 C NMR spectroscopy, mass spectrometry, and elemental analysis; the molecular structures of 2-5 were determined by X-ray crystallography. In the solid state and presumably also in solution all compounds feature a monomeric structure with an intramolecularly coordinated dimethylamino group. The resulting coordinative and electronic saturation of the metal center leads to a drastically decreased reactivity against moisture and air. The observed dynamic behavior in solution is based on fast haptotropic shifts in a "windscreen-wiper" type process. Sufficient volatility and well-behaved fragmentation makes 6 a suitable precursor for the deposition of gallium in the MOCVD process.
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