Elastomeric perfluoropolyether molds are applied to pattern arrays of sub-500 nm inorganic oxide features. This versatile soft-lithography technique can be used to pattern a wide range of materials; in this work inorganic oxides including TiO2 , SnO2 , ZnO, ITO, and BaTiO3 are patterned on a variety of substrates with different aspect ratios. An example of TiO2 posts is shown in the figure.

We present a high-throughput method for fabricating large arrays of surface-enhanced Raman scattering (SERS) active gold dimers. Using a large-area/low-cost nanopatterning method in conjunction with a meniscus force deposition technique, we were able to create large arrays of uniformly spaced nanoclusters comprising two 60-nm gold nanospheres. Raman measurements of a thiophenol monolayer deposited on smaller scale arrays of aligned dimers yielded enhancement factors as high as 10 9 . Polarization-controlled measurements show spectral peak heights to be 10-100 times smaller when the incident beam is polarized perpendicularly to the dimer axis, confirming that the measured enhancements arise from the 'hot spots' between the two nanospheres.

We fabricated ordered bulk heterojunction photovoltaic (PV) cells using a perfluoropolyether (PFPE) elastomeric mold to control the donor−acceptor interfacial morphology within devices. Anatase titania nanostructures with postlike features ranging from 30 to 100 nm in height and 30 to 65 nm in spacing were fabricated using the Pattern Replication In Nonwetting Templates (PRINT) process. The nanostructured devices showed a 2-fold improvement in both short-circuit current (J sc) and power conversion efficiency (PCE) relative to reference bilayer cells. Additionally, the titania was functionalized with Z907 dye to increase both the short-circuit current (J sc) and open-circuit voltage (V oc). As a result we observed a device efficiency (ηeff) of 0.6%, the highest recorded efficiency value so far for an imprinted titania−P3HT device.

Ordered, two-dimensional cadmium selenide (CdSe) arrays have been fabricated on indium-doped tin oxide (ITO) electrodes using the pattern replication in nonwetting templates (PRINT) process. CdSe quantum dots (QDs) with an average diameter of 2.7 nm and a pyridine surface ligand were used for patterning. The PRINT technique utilizes a perfluoropolyether (PFPE) elastomeric mold that is tolerant of most organic solvents, thus allowing solutions of CdSe QDs in 4-picoline to be used for patterning without significant deformation of the mold. Nanometer-scale diffraction gratings have been successfully replicated with CdSe QDs.