A Hybrid Physical-Chemical Vapour Deposition (HPCVD) system consisting of separately controlled Mg-source heater and substrate heater is used to grow MgB 2 thin films and thick films at various temperatures. We are able to grow superconducting MgB 2 thin films at temperatures as low as 350°C with a T c0 of 35.5 K. MgB 2 films up to 4 m in thickness grown at 550°C have J c over 10 6 A/cm 2 at 5 K and zero applied field. The low deposition temperature of MgB 2 films is desirable for all-MgB 2 tunnel junctions and MgB 2 thick films are important for applications in coated conductors.
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