The time evolution of the resistance of amorphous thin films of the phase change materials Ge 2 Sb 2 Te 5 , GeTe and AgIn-Sb 2 Te is measured during annealing at T = 80 • C. The annealing process is interrupted by several fast temperature dips to determine the changing temperature dependence of the resistance. This procedure enables us to identify to what extent the resistance increase over time can be traced back to an increase in activation energy E A or to a rise of the prefactor R * . We observe that, depending on the material, the dominating contribution to the increase in resistance during annealing can be either a change in activation energy (Ge 2 Sb 2 Te 5 ) or a change in prefactor (AgIn-Sb 2 Te). In the case of GeTe, both contribute about equally. We conclude that any phenomenological model for the resistance drift in amorphous phase change materials that is based on the increase of one parameter alone (e.g., the activation energy) cannot claim general validity.
Chalcogenide-based phase-change materials play a prominent role in information technology. In spite of decades of research, the details of electrical transport in these materials are still debated. In this article, we present a unified model based on multiple-trapping transport together with 3D Poole-Frenkel emission from a two-center Coulomb potential. With this model, we are able to explain electrical transport both in as-deposited phase-change material thin films, similar to experimental conditions in early work dating back to the 1970s, and in melt-quenched phase-change materials in nanometer-scale phase-change memory devices typically used in recent studies. Experimental measurements on two widely different device platforms show remarkable agreement with the proposed mechanism over a wide range of temperatures and electric fields. In addition, the proposed model is able to seamlessly capture the temporal evolution of the transport properties of the meltquenched phase upon structural relaxation.
Memory based on phase change materials is currently the most promising candidate for bridging the gap in access time between memory and storage in traditional memory hierarchy. However, multilevel storage is still hindered by the so-called resistance drift commonly related to structural relaxation of the amorphous phase. Here, we present the temporal evolution of infrared spectra measured on amorphous thin films of the three phase change materials Ag4In3Sb67Te26, GeTe and the most popular Ge2Sb2Te5. A widening of the bandgap upon annealing accompanied by a decrease of the optical dielectric constant ε∞ is observed for all three materials. Quantitative comparison with experimental data for the apparent activation energy of conduction reveals that the temporal evolution of bandgap and activation energy can be decoupled. The case of Ag4In3Sb67Te26, where the increase of activation energy is significantly smaller than the bandgap widening, demonstrates the possibility to identify new phase change materials with reduced resistance drift.
Many chalcogenide glasses undergo a breakdown in electronic resistance above a critical field strength. Known as threshold switching, this mechanism enables field-induced crystallization in emerging phase-change memory. Purely electronic as well as crystal nucleation assisted models have been employed to explain the electronic breakdown. Here, picosecond electric pulses are used to excite amorphous Ag_{4}In_{3}Sb_{67}Te_{26}. Field-dependent reversible changes in conductivity and pulse-driven crystallization are observed. The present results show that threshold switching can take place within the electric pulse on subpicosecond time scales-faster than crystals can nucleate. This supports purely electronic models of threshold switching and reveals potential applications as an ultrafast electronic switch.
Storage concepts employing the resistance of phase-change memory (PRAM) have matured in recent years. Attempts to model the conduction in the amorphous state of phase-change materials dominating the resistance of PRAM devices commonly invoke a connection to the electronic density-of-states (DoS) of the active material in form of a “distance between trap states s”. Here, we point out that s depends on the occupation of defects and hence on temperature. To verify this, we numerically study how the occupation in the DoS of Ge2Sb2Te5 is affected by changes of temperature and illumination. Employing a charge-transport model based on the Poole-Frenkel effect, we correlate these changes to the field- and temperature-dependent current-voltage characteristics of lateral devices of amorphous Ge2Sb2Te5, measured in darkness and under illumination. In agreement with our calculations, we find a pronounced temperature-dependence of s. As the device-current depends exponentially on the value of s, accounting for its temperature-dependence has profound impact on device modeling.
Electrical transport in chalcogenide-based phase change materials is an active area of research owing to the prominent role played by these materials in the field of information technology. Here, we present transport measurements (IV curves) obtained on line-cells of as-deposited amorphous phase change materials (Ge2Sb2Te5, GeTe, Ag4In3Sb66Te27) over a wide voltage and temperature range (300 K to 160 K). The well defined geometry of our devices enables a description of the transport behavior in terms of conductivity vs. electric field. At higher temperatures (300 K ≥ T ≥ 220 K) and low to intermediate fields (F < 20 V/μm), the data can be described within the framework of a previously developed model, which is based on multiple trapping transport together with 3D Poole-Frenkel emission from a two-center Coulomb potential. Based on this model, we observe a temperature dependence of the inter-trap distance, which we can relate to a temperature dependence in the occupation of the defect creating the Coulomb potential governing Poole-Frenkel emission. At higher fields and lower temperatures, the dependency of the IV curve on the electric field can be described by ln(I/I0) = (F/Fc)2. By combining this contribution with that of the Poole-Frenkel emission, we can show that the slope at high fields, Fc, is independent of temperature. We argue that models based on direct tunneling or thermally assisted tunneling from a single defect into the valence band cannot explain the observed behavior quantitatively.
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