The differences in work function (W.F.) and cohesive energy (C.E.) of the phases constituting the cathode, plays an important role in the formation of the converted layer at its nearsurface region during cathodic arc deposition. As a consequence, this also affects the deposition conditions for the coatings. In this study, we explore the effect of W.F. and C.E. of the constituent phases during arc evaporation by utilizing two kinds of customized Ti-50 at.% Al cathodes with different phase compositions. Our results show that during reactive arc evaporation the disparity in W.F. and C.E. among the constituent phases of Ti-50 at.% Al cathodes leads to preferential erosion of the phases with lower W.F. and C.E.. The aforementioned preferential erosion begets higher surface roughness on the Ti-50 at.% Al cathode with a wider range of W.F. and C.E. disparity. It is also observed that the thermal conductivity of the Ti-50 at.% Al cathode plays a dominant role in the deposition rate of Ti-Al-N coating. This article also presents how the surface geometry of the cathode in the presence of arc guiding magnetic field significantly influences the microstructure of the deposited coatings.

Coatings of (Al1-xVx)2O3, with x ranging from 0 to 1, were deposited by pulsed DC reactive sputter deposition on Si(100) at a temperature of 550 °C. XRD showed three different crystal structures depending on V-metal fraction in the coating: α-V2O3 rhombohedral structure for 100 at.% V, a defect spinel structure for the intermediate region, 63 -42 at.% V. At lower V-content, 18 and 7 at.%, a gamma-alumina-like solid solution was observed, shifted to larger d-spacing compared to pure γ-Al2O3. The microstructure changes from large columnar faceted grains for α-V2O3 to smaller equiaxed grains when lowering the vanadium content toward pure γ-Al2O3. Annealing in air resulted in formation of V2O5 crystals on the surface of the coating after annealing to 500 °C for 42 at.% V and 700 °C for 18 at.% V metal fraction respectively. The highest thermal stability was shown for pure γ-Al2O3-coating, which transformed to α-Al2O3 after annealing to 1100° C. Highest hardness was observed for the Al-rich oxides, ~24 GPa. The latter decreased with increasing V- * Corresponding authors Email address: ludvig.landalv@liu.se (L. Landälv) Per.eklund@liu.se (P. Eklund) content, larger than 7 at.% V metal fraction. The measured hardness after annealing in air decreased in conjunction with the onset of further oxidation of the coatings.

Detailed knowledge of correlations between direct current (DC) cathodic arc deposition process parameters, plasma properties, and the microstructure of deposited coatings are essential for a comprehensive understanding of the DC cathodic arc deposition process. In this study we have probed the plasma, generated by DC arc on a Ti-50 at.% Al cathode in a N2 ambience, at the growth front of the TiAlN coating. Several consequences of an increasing N2 pressure are observed, including a decreased electron temperature, an increased electron density, and a loss of energetic ions. As a result, the preferred growth texture switches from 220 to 111. It is also observed that neutrals in the plasma can significantly contribute to the growth of TiAlN coatings.

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