We have investigated the carbon and fluoride contaminants on silicon wafers during their storage in quartz-glass boxes equipped with carrier cases made of either polypropylene (PP), polybutylene-terephthalate (PBT), or perfluoroalkoxy polymer (PFA). The adsorbed organic contaminants on the wafer surfaces were identified by time-of-flight secondary-ion mass spectrometry (TOF-SIMS). The concentrations of contaminants on the wafer surface have been measured as a function of wafer storage positions as well as carrier case storage time. For quantitative analyses, secondary-ion mass spectrometry (SIMS) combined with the encapsulation method was employed, and carbon ( 12 C − ) and fluorine ( 19 F − ) ions were detected. It has been found that the amount of adsorbed contaminants on the surface of silicon wafers depend on both the wafer storage conditions and the carrier case materials.
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