No abstract

No abstract

All reinforcements for polymer-matrix composites must be coated with a suitable material in the form of a thin film to improve compatibility and interfacial adhesion between the reinforcement and the polymer matrix. In this study, plasma nanotechnology was used to synthetize such functional nanocoatings using pure tetravinylsilane (TVS) and its mixtures with oxygen gas (O2) as precursors. The plasma-coated glass fibers (GFs) were unidirectionally embedded in a polyester resin to produce short composite beams that were analyzed by a short-beam-shear test to determine the shear strength characterizing the functionality of the nanocoatings in a GF/polyester composite. The developed plasma nanocoatings allowed controlling the shear strength between 26.2–44.1 MPa depending on deposition conditions, i.e., the radiofrequency (RF) power and the oxygen fraction in the TVS/O2 mixture. This range of shear strength appears to be sufficiently broad to be used in the design of composites.

Pure tetravinylsilane and its oxygen mixture were used to deposit oxidized plasma polymer films at various effective power (0.1–10 W) and various oxygen fractions (0–0.71) using RF pulsed plasma. The optical properties (refractive index, extinction coefficient, band gap) of the deposited films were investigated by spectroscopic ellipsometry (230–830 nm) using an optical model and Tauc‒Lorentz parametrization. Analyses of chemical and mechanical properties of films allowed for the interpretation of changes in optical properties with deposition conditions. The refractive index was revealed to increase with enhanced effective power due to the increased crosslinking of the plasma polymer network but decreased when increasing the oxygen fraction due to the decrease of polymer crosslinking as the number of carbon bonds in the plasma polymer network was eliminated. A very strong positive correlation was found between the Young’s modulus and the refractive index for oxidized plasma polymer films. The optical properties of films correlated with their chemical properties for the specific deposition conditions used in this study. The band gap (1.9–2.9 eV) was assumed to be widened due to the increased concentration of vinyl groups in oxidized plasma polymer films.

The power dependence of the plasma species in nonthermal tetravinylsilane plasmas used for thin-film deposition is investigated by mass spectrometry.Mass spectra analysis reveals the dominant carbon-and silicon-containing species responsible for film growth. The deposition rate determined by in situ