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The influence of an annealing step at about 500°C after emitter diffusion of multicrystalline solar cells is investigated. Neighboring wafers from a silicon ingot were processed using different annealing durations and temperatures. The efficiency of the cells was measured and detailed light beam induced current measurements were performed. These show that mainly areas with high contents of precipitates near the crucible walls are affected by the anneal. An efficiency increase from 14.5 to 15.4% by a 2h anneal at 500°C was observed. The effect seems to be more likely external than internal gettering

Minority carrier recombination is studied in multicrystalline ingot cast silicon solar cells. The normalized recombination strength Gamma of dislocations is obtained by correlating topograms of the internal quantum efficiency (IQE) with those of the dislocation density rho. Gamma is obtained by fitting an extended theory of Donolato to the experimental data. The measured Gamma-values vary significantly between adjacent dislocation clusters and correlate with the spatial pattern of the dislocations. All Gamma-values are strongly dependent on the parameters of the solar cell process. The influence of phosphorus diffusion and hydrogenation is shown. After solidification of the silicon, impurities from the crucible enter the ingot and deteriorate its border regions during cooling to room temperature. These deteriorated border regions can be significantly improved by an additional low temperature anneal that is applied after phosphorus diffusion. The experiments indicate that the mechanism of the anneal is external phosphorus gettering into the emitter

In this study, we have utilized characterization methods to identify the nature of metal impurity precipitates in low performance regions of multicrystalline silicon solar cells. Specifically, we have utilized synchrotron-based x-ray fluorescence and x-ray absorption spectromicroscopy to study the elemental and chemical nature of these impurity precipitates, respectively. We have detected nanometer-scale precipitates of Fe, Cr, Ni, Cu, and Au in multicrystalline silicon materials from a variety of solar cell manufacturers. Additionally, we have obtained a direct correlation between the impurity precipitates and regions of low light-induced current, providing direct proof that metal impurities play a significant role in the performance of multicrystalline silicon solar cells. Furthermore, we have identified the chemical state of iron precipitates in the low-performance regions. These results indicate that the iron precipitates are in the form of oxide or silicate compound. These compounds are highly stable and cannot be removed with standard silicon processing, indicating remediation efforts via impurity removal need to be improved. Future improvements to multicrystalline silicon solar cell performance can be best obtained by inhibiting oxygen and metal impurity introduction as well as modifying thermal treatments during crystal growth to avoid oxide or silicate formation

The evolution during silicon solar cell processing of performance-limiting iron impurities is investigated with synchrotron-based x-ray fluorescence microscopy. We find that during industrial phosphorus diffusion, bulk precipitate dissolution is incomplete in wafers with high metal content, specifically ingot border material. Postdiffusion low-temperature annealing is not found to alter appreciably the size or spatial distribution of FeSi2 precipitates, although cell efficiency improves due to a decrease in iron interstitial concentration. Gettering simulations successfully model experiment results and suggest the efficacy of high- and low-temperature processing to reduce both precipitated and interstitial iron concentrations, respectively