The fluidized‐bed chemical vapor deposition (CVD) process for polycrystalline silicon production is considered to be the most attractive alternative to the conventional bell‐jar process. In order to obtain stable operation, high space‐time‐yields and high purity of the product several obstacles have to be eliminated. Reaction conditions must be optimized to avoid the homogeneous decomposition of silane and minimize silicon dust formation. The effect of temperature, silane partial pressure, gas velocity and the size of bed particles has to be identified. These dependencies and the interaction between hydrodynamics and kinetics of homogeneous and heterogeneous CVD‐reactions were studied in a laboratory‐scale fluidized‐bed reactor.

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J e  r o à m e B a y l e P a t r i c k L e r o y T h i e r r y G a u t h i e r