We demonstrate direct three-dimensional (3-D) microfabrication inside a volume of silica glass. The whole fabrication process was carried out in two steps:(i) writing of the preprogrammed 3-D pattern inside silica glass by focused femtosecond (fs) laser pulses and (ii) etching of the written structure in a 5% aqueous solution of HF acid. This technique allows fabrication of 3-D channels as small as 10mum in diameter inside the volume with any angle of interconnection and a high aspect ratio (10mum -diameter channels in a 100mum -thick silica slab).
The direct electrodeposition of Ag2O films was discovered for the first time using a new strategy termed “oxides synthesis induced by electrogenerated acid”. The Ag2O film with a bandgap energy of 1.46 eV is suited to a light absorption layer in photovoltaic cells.
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