Multiscalar films are produced in order to combine both toughness and strength into a multilayer film. These structures incorporate both a strengthening phase and a toughening phase in a compositionally modulated microcomposite. The mechanical properties and microstructure for thick (-50 pm> MO/W multiscalar films have been characterized. A detailed microstructural analysis (including transmission electron microscopy, scanning electron microscopy, and x-ray techniques) of MO/W multiscalar ftlms has shown that large single-crystal columns of MO interspersed with epitaxial layers of W extend for the entire film thickness. The microstructure is a zone-II-type microstructure, yet the temperatures during deposition are well below the lower limit (0.3 T/T,) previously reported for such microstructures. Hardness and tensile tests have shown that a multiscalar approach is capable of tailoring a desired strength and toughness into a multilayered film.
The evolution of texture in thin films must be fully understood in order to take advantage of favorable crystallographic orientations in a material for a given application. The development of an out-of-plane texture (preferred crystallographic orientation in the growth direction) and an in-plane texture (preferred crystallographic orientation in the plane of growth) in sputter deposited, thin mo films on Si was studied using transmission electron microscopy and diffraction, and conventional x-ray pole figures. For a range of deposition parameters, a strong (110) out-of-plane texture developed within 1000Å, while a strong in-plane texture did not develop until a thickness of about 1 μm.
Investigation of lowfrequency noise and electromigration failure in multilayered metallizations AIP Conf. Proc. 282, 49 (1992); 10.1063/1.44362 Magnetron sputtered boron films and Ti/B multilayer structuresThe growth textures of thick sputtered MO metallizations and MO/W multilayers, were characterized via a synchrotron white-beam (WB) x-ray transmission Laue technique. Transmission x-ray diffraction studies of MO specimens up to 61 pm thick were performed with WB synchrotron radiation; while the practical thickness limit for similar observations using a conventional laboratory Cu K(a) x-ray source is ten times smaller. This unique approach used polychromatic x rays to simultaneously produce diffraction from a wide spread of orientations of many crystallographic planes for all the grains within a relatively large specimen volume (-60X lo6 pm3). These patterns were obtained for polycrystalline 31-and 61-w-thick MO/W multilayer specimens, and a 35pm-thick-monolithic MO foil specimen. In all three cases the alignment of specimen grains was similar to what would be expected for single-crystal transmission patterns, except that the recorded intensity distributed was less localized. The WB transmission images were indexed using a reciprocal space construction for the Laue case. ln the multilayers, the grains were oriented out-of-plane such that (110) crystallographic planes were aligned in the direction of sputter growth, while in the monolithic MO specimen (111) crystaliographic planes were so aligned, i.e., perpendicular to the deposition substrate. A spread in orientation of -5" was measured in the multilayer specimens, while the monolithic MO specimen showed a spread of -30" when compared to a perfect single-crystal orientation. Preferred orientation was also observed within the plane of growth to varying degrees for all three samples. 8 I995 American Institute of Physics. 3812
It is important that inherent strains (or stresses) be controlled during thin film processing. This study used grazing incidence x-ray scattering (G1XS) to determine the strain gradient present in a ∼1700 Å sputtered molybdenum thin film. In particular, the gradient in the hydrostatic strain was Measured. This observation corresponded to assessing the average change in the lattice parameter as a function of depth throughout the thickness of the film. In addition, the strain ellipsoids, which represent the state of strain in three dimensions, were calculated as a function of film depth. It was shown that the strain varied throughout the ∼1700 Å Mo film thickness and that the principal strains were anisotropic, with one principal strain much larger than the others in Magnitude.
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