Resonant dielectric nanostructures represent a promising platform for light manipulation at the nanoscale. In this paper, we describe an active photonic system based on Ge(Si) quantum dots coupled to silicon nanodisks. We show that Mie resonances govern the enhancement of the photoluminescent signal from embedded quantum dots due to a good spatial overlap of the emitter position with the electric field of Mie modes. We identify the coupling mechanism, which allows for engineering the resonant Mie modes through the interaction of several nanodisks. In particular, the mode hybridization in a nanodisk trimer results in an up to 10-fold enhancement of the luminescent signal due to the excitation of resonant antisymmetric magnetic and electric dipole modes.

Germanium self-assembled nanoislands and quantum dots are very prospective for CMOS-compatible optoelectronic integrated circuits but their photoluminescence (PL) intensity is still insufficient for many practical applications. Here, it is demonstrated experimentally that the PL of Ge nanoislands in silicon photonic crystal slabs (PCS) with hexagonal lattice can be dramatically enhanced due to the involvement in the emission process of the bounds states in the continuum. These high-Q photonic resonances allow to achieve PL resonant peaks with the quality factor as high as 2200 and with the peak PL enhancement factor of more than two orders of magnitude. The corresponding integrated PL enhancement is demonstrated to be more than one order of magnitude. This effect is studied theoretically by the Fourier modal method in the scattering matrix form. The symmetry of the quasi-normal guided modes in the PCS is described in terms of group theory. This work paves the way toward a new class of optoelectronic components compatible with silicon technology.

We report photoluminescence (PL) studies of Ge(Si) self-assembled islands embedded into a tensile-strained Si layer grown on smooth relaxed Si0.75Ge0.25∕Si(001) buffer layers subjected to chemical-mechanical polishing. The intense PL from Ge(Si) islands embedded into a strained Si layer compared to the PL from islands grown on unstrained Si(001) is associated with efficient confinement of electrons in a strained Si layer on the heterojunction with islands. The observed dependence of the island PL peak position on thickness of strained Si layer confirms the validity of the model for real-space indirect optical transition between electrons confined in the strained Si layer, and holes localized in islands.

Luminescent properties of self-assembled Ge(Si)/SOI nanoislands embedded in twodimensional photonic crystal (PhC) slabs with and without L3 cavities were studied with PhC period a varied between 350 and 600 nm. For small periods (a£450 nm), the nanoisland luminescence, which spans over the wavelength range from 1.2 to 1.6 μm, overlaps with the PhC bandgap resulting in a coupling with the localized modes of an L3 cavity. It is shown that for larger periods (a>450 nm), nanoisland emission couples to the radiative modes above the bandgap located in the vicinity of the Г-point of the photonic crystal Brillouin zone and is characterized by the low group velocity. In this case, a significant (up to 35-fold) increase in the PL intensity was observed in a number of PhCs without a cavity. From a technological point of view, the latter result makes such types of photonic crystal structures particularly promising for the realization of Si-based light emitters operating in the telecommunication wavelength range because, firstly, their manufacture does not require a precise cavity formation and, secondly, they provide a much larger area for the radiating region, as compared with PhC cavities.

No abstract

An original approach to selective doping of Si by antimony (Sb) in molecular beam epitaxy (MBE) is proposed and verified experimentally. This approach is based on controllable utilization of the effect of Sb segregation. In particular, the sharp dependence of Sb segregation on growth temperature in the range of 300-550 C is exploited. The growth temperature variations between the kinetically limited and maximum segregation regimes are suggested to be utilized in order to obtain selectively doped structures with abrupt doping profiles. It is demonstrated that the proposed technique allows formation of selectively doped Si:Sb layers, including delta (d-)doped layers in which Sb concentrations can be varied from 5 Â 10 15 to 10 20 cm À3. The obtained doped structures are shown to have a high crystalline quality and the short-term growth interruptions, which are needed to change the substrate temperature, do not lead to any significant accumulation of background impurities in grown samples. Realization of the proposed approach requires neither too low (<300 C), nor too high (>600 C) growth temperatures or any special equipment for the MBE machines. V

No abstract

The results of the study of the effect of strained SiGe layers on the critical thickness of two-dimensional growth of Ge layer in different SiGe/Si(001) structures are presented. A significant influence of buried strained SiGe layer on the growth of Ge has been found out, which remains considerable even for SiGe layers capped by unstrained Si layer of thickness up to 3.5 nm. The experimental results are well described by the proposed model, where obtained features are explained by means of introducing a phenomenological parameter called “effective decay length” of the strain energy accumulated in the structure.