The effect of surface roughness on magnetoresistance (MR) and magnetic properties of Ta/NiFe films is investigated as a function of surface roughness and NiFe thickness. The surface roughness effects on the MR ratio, Δρ/ρ, of Ta/NiFe films can be separated into two different regimes. In regime I, Δρ/ρ of NiFe films linearly decreases with increasing roughness mostly due to the increase in resistivity of NiFe, while Δρ remains constant. In regime II at increased roughness, domain wall pinning is induced by surface roughness causing a degradation of the uniaxial anisotropy of NiFe and leading to the decrease in Δρ, resulting in the steeper MR ratio decrease. The change in MR properties of NiFe films with varying thicknesses can be correlated with the change in surface resistivity, ρs. Strongly textured NiFe(111) grown onto smooth substrate yields higher anisotropy and lower coercivity than those deposited onto rough substrates over a wide range of NiFe thicknesses.
Matsushita resistors have a much smaller heat capacity than Speer resistors, and thus are preferable in some thermometry applications at temperatures below 1 K.
Magnetic properties of amorphous alloys Fe83−xVxB14Si3 containing 0.02–0.85 at. % nitrogen have been studied from 4 K to the crystallization temperatures. The effect of vanadium in these alloys is to decrease the ferromagnetic transition temperature TC at 23 K/at. % V, as well as the magnetization σ at 8.8 (emu/gm)/at. % V. This indicates loss of ferromagnetism in this alloy system for V concentrations greater than 26 at. %. The addition of nitrogen increases crystallization temperature Tx, saturation magnetization, and spin wave exchange stiffness constant D. The observed T-dependence of the magnetization over the entire temperature range 4–300 K, can be described only by taking into account both the T3/2 and T5/2 terms. This is unlike the normal extended T3/2 behaviour observed in amorphous alloys having TC above room temperature.
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