The solubility isotherms of hydrogen in epitaxial Nb͑110͒ films have been determined via in situ x-ray lattice-parameter measurements. The Nb films were grown by molecular-beam epitaxial techniques on Al 2 O 3 (1120) substrates with thicknesses ranging from 32 to 527 nm. All isotherms can be well described by the standard expression for the solubility of a monatomic lattice gas. Aside from the metal-hydrogen interaction, which appears to be bulklike, all other properties exhibit a strong thickness dependence, including the hydrogen-hydrogen interaction, the critical temperature for the ␣-␣Ј transition, and the maximum latticeparameter change that can be reached in saturation. For the critical temperature we find a scaling with the film thickness, which most likely is due to the elastic boundary condition provided by the rigid substrate. The clamping of the epitaxial film to the substrate hinders critical fluctuations of macroscopic hydrogen density modes from developing, thereby lowering the critical temperature for the ␣-␣Ј transition.
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