Self-assembly of KHCO(3) fibers is observed when glassy oligomerized films of poly[(aminopropyl)siloxane] containing K(+) ions, denoted K(+)/poly-APS, are exposed to CO(2) and H(2)O. The fibers are crystalline, narrow (0.4-3 microm diam), high aspect ratio (up to at least 300), and, on the basis of Raman spectroscopy, dominated by KHCO(3). The fibers contain fluid that is dominated by aqueous potassium formate (KOOCH). A multistep phenomenological model is proposed to account for the self-assembly.

The effect of rapid thermal annealing ͑RTA͒ temperature on the formation of the cobalt silicide ͑CoSi͒ was investigated using x-ray photoelectron spectroscopy ͑XPS͒ and micro Raman spectroscopy. With 125 Å of Co deposited on single-crystalline Si wafers and capped by a Ti thin film, the wafers were rapid thermal annealed at 450, 460, 470, 480, and 490°C. These wafers were then stripped with a sulfuric acid peroxide mixture treatment. XPS was used to determine the chemical composition of the CoSi thin films, and the Co Auger parameter was continuously monitored along with ion sputtering to provide a chemical-state depth profile. Micro-Raman spectroscopy was used as a nondestructive method to characterize the film thickness and uniformity of the CoSi thin films on Si wafers. The Raman shifts at 204 and 220 cm Ϫ1 due to CoSi and the Raman shift at 150 cm Ϫ1 due to Co 2 Si are reported. The product ␣d (␣ is the absorption coefficient, d is the film thickness͒, which indicates the CoSi film thickness, was calculated from the Si excitation wavelength of 520 cm 1 . The behavior of the calculated ␣d as a function of the RTA temperature confirms the XPS result.

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