Yizhijiannao granules have been shown to improve cognitive function in Alzheimer's disease patients. The present study sought to explore the mechanisms involved in the cognitive enhancing effects of Yizhijiannao granule. Senescence-accelerated mouse prone 8 mice with learning and memory disorders were intragastrically treated with Yizhijiannao granule for 8 weeks. Mice intragastrically treated with double distilled water for 8 weeks were considered as the control group. 2D gel electrophoresis was used to isolate total protein from the temporal lobe of senescence-accelerated mouse prone 8 mice, and differential protein spots were obtained by mass spectrometry. Thirty-seven differential protein spots were found in the temporal lobe area of both groups. Ten protein spots were identified: high mobility group box 1, dimethylarginine dimethylaminohydrolase-1, neuroglobin, hemoglobin beta adult major chain, peroxiredoxin-6, cofilin-1, flotillin 1, peptidylprolyl isomerase A, voltage-dependent anion channel-2 and chaperonin containing TCP1, and subunit 2. Among other functions, these proteins are separately involved in the regulation of amyloid beta production, oxidative stress, neuroinflammation, regulation of tau phosphorylation, and regulation of neuronal apoptosis. Our results revealed that Yizhijiannao granule can regulate the expression of various proteins in the temporal lobe of senescence-accelerated mouse prone 8 mice, and may be therapeutically beneficial for the treatment of Alzheimer's disease.
An effective post etch treatment (PET) process was proposed to eliminate etch damage in the channel hole, of which the depth and the aspect ratio is beyond 3 μm and 30:1 respectively, prior to selective epitaxial growth (SEG) in three dimensions (3D) NAND flash memory. In this work, it is demonstrated that the damaged layer both at the channel hole bottom and sidewall induced by capacitively coupled plasma (CCP) was effectively eliminated using low energy plasma of CL 2 +NF 3 /CH 2 F 2 in PET, and then obtaining an excellent surface condition in channel hole and fabricating a void-free SEG epitaxial layer.
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