To eliminate surface limitation caused by Silicon impurity in RB-SiC space mirrors, a relatively thick Si film is deposited on well finished RB-SiC substrate by a new process-ion assisted depositing (IAD) to provide a better polishable surface. Testing results of IAD-Si properties are provided, showing that the amorphous film has great thermal shock resistance. Then, polishing experiments on 10±0.5µm thick IAD-Si layers are accomplished focusing on smoother surface. Surface figure and micro-roughness of the coating after polished reach 0.026λ RMS (λ=0.6328nm) and less than 0.5nm RMS respectively. Moreover, reflectivity of IAD-Si polished surface with reflective films increases higher than 4.5% than that of RB-SiC in 360-1100nm. High reflectivity and desirable thermal property make IAD-Si an attractive coating material for RB-SiC space mirrors.
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