In-plane anisotropic two-dimensional (2D) materials, emerging as an intriguing type of 2D family, provide an ideal platform for designing and fabrication of optoelectronic devices. Exploring air-stable and strong inplane anisotropic 2D materials is still challenging and promising for polarized photodetection. Herein, SiP 2 , a 2D IV−V semiconductor, is successfully prepared and introduced into an in-plane anisotropic 2D family. The basic characterizations combined with theoretical calculations reveal 2D SiP 2 to exhibit an intrinsically low-symmetry structure, the in-plane anisotropy of phonon vibrations, and an anisotropically dispersed band structure. Moreover, the photodetector based on 2D SiP 2 exhibits high performance with a high detectivity of 10 12 Jones, a large light on/ off ratio of 10 3 , a low dark current of 10 −13 A, and a fast response speed of 3 ms. Furthermore, 2D SiP 2 demonstrates a high anisotropic photodetection with an anisotropic ratio up to 2. In addition, the polarization-sensitive photodetector presents a dichroic ratio of 1.6 due to the intrinsic linear dichroism. These good characteristics make 2D SiP 2 a promising candidate as an in-plane anisotropic semiconductor for high-sensitivity and polarized optoelectronic applications.
Two-dimensional (2D) materials are extremely attractive for the construction of highly sensitive photodetectors due to their unique electronic and optical properties. However, developing 2D photodetectors with ultrahigh sensitivity for extremely low-light-level detection is still a challenge owing to the limitation of high dark current and low detectivity. Herein, a gate-controlled phototransistor based on 2D SiP2/hexagonal boron nitride (h-BN) was rationally designed and demonstrated ultrahigh sensitivity for the first time. With a back-gate device geometry, the SiP2/h-BN phototransistor exhibits an ultrahigh detectivity of 3.4 × 1013 Jones, which is one of the highest values among 2D material-based photodetectors. In addition, the phototransistor also shows a gate tunable responsivity of ≤43.5 A/W at a gate voltage of 30 V due to the photogating effect. The ultrahigh sensitivity of the SiP2-based phototransistor is attributed to the extremely low dark current suppressed by the phototransistor configuration and the improved photocurrent by using h-BN as a substrate to reduce charge scattering. This work provides a facile strategy for improving the detectivity of photodetectors and validates the great potential of 2D SiP2 phototransistors for ultrasensitive optoelectronic applications.
Two-dimensional (2D) materials driven by their unique electronic and optoelectronic properties have opened up possibilities for their various applications. The large and high-quality single crystals are essential to fabricate high-performance 2D devices for practical applications. Herein, IV-V 2D GeP single crystals with high-quality and large size of 20 × 15 × 5 mm3 were successfully grown by the Bi flux growth method. The crystalline quality of GeP was confirmed by high-resolution X-ray diffraction (HRXRD), Laue diffraction, electron probe microanalysis (EPMA) and Raman spectroscopy. Additionally, intrinsic anisotropic optical properties were investigated by angle-resolved polarized Raman spectroscopy (ARPRS) and transmission spectra in detail. Furthermore, we fabricated high-performance photodetectors based on GeP, presenting a relatively large photocurrent over 3 mA. More generally, our results will significantly contribute the GeP crystal to the wide optoelectronic applications.
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