Abstract-The process to manufacture microfluidic chip using quartz glass or Pyrex 7740 glass is expensive and complex. In order to overcome these, save production costs, simplify the process, and shorten the production cycle, soda-lime glass was designed as substrate carrier; positive photoresist AZ 4620 was designed as mask layer, to make the microfluidic chip production process efficient, rapid, and low-cost. Some key technique, such as thickness of photoresist, various stages of baking parameters, exposure and developer volume, etching environment and the glass buffered oxide etching (BOE) ratio had been solved. The adhesion of the photoresist with the glass, and photoresist's tolerance time in BOE had been solved as well. With the optimized process, the etching depth can achieve 80μm, the minimum feature size could be less than 50μm, the sidewall steepness is less than 100°, the flatness error is less than ± 1.5μm, and the production cycle is only 4 hour.
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