IntroductionHelium can be produced in tritium storage materials and structural materials of fission reactors, accelerators and future controlled fusion reactors. Its insolubility and high mobility of the helium in the materials are crucial to study its formation and evolution in materials. Helium atoms can not be naturally dissolved in the materials, but are easily trapped by dislocation, vacancies and voids. With the increment of helium concentration, helium bubbles in the materials will be formed by migrating, diffusing and coalescence of helium atoms. Helium may change microstructure of the materials,and even cause serious degradation of some macroscopic mechanical properties of the materials, such as swelling and helium-induced brittleness [1][2][3]. Therefore, studies of the behavior of helium in materials are critically important in material applications. However, helium behavior studies in materials are quite complicated, many problems, such as the evolution of helium-related defects and mechanism of helium brittleness, are still under investigation.There are three traditional methods to artificially introduce helium into materials: tritium ageing [4], neutron irradiation [5] and helium ion implantation [6]. In recent years, a magnetron sputtering technique [7][8][9] which works in a mixture of helium (He) and argon (Ar) gas ambient has been developed. This method can introduce helium into the growing metal films. It has many advantages, such as controllable helium concentration and a uniform He distribution in depth.Many experiments have been used to study the behavior of helium in titanium film. As a sensitive method for studying vacancy-like defects, positron annihilation technique has been effectively
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