In this work, we proposed new fabrication equipment for using the back side exposure technique in Gen.8 glass size and discussed a self-alignment technique for fabrication of a-IGZO TFTs which result in inverted staggered bottom gate devices, to simplify the OLED array processing. The Cgs of a-IGZO TFTs with back side exposure process was lower about 40% than that of a a-IGZO TFTs with typical process. The decrease in capacitance value of the back side exposure process a-IGZO TFTs is because the overlap area between the gate and source/drain electrodes has become decrease. At Vds of 10V, the back side exposure process a-IGZO TFTs represent μsat of 12.43 cm2/Vs, Vth of 0.75V, on-current of 74.4uA, S-Factor of 0.23V/dec.
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