BackgroundBentonite, a montmorillonite clay, has been used as a classical remedy strategy for a long time. Recently, bentonite has been used as a raw material in cosmetic products because of its antibacterial and antioxidant properties. However, the therapeutic effect of bentonite on burn injuries has not yet been identi ed. Here, we explored the therapeutic effect of a novel bentonite complex, which was developed for medical use, on burn wounds and the anti-in ammatory function of bentonite clay in the complex in vitro.
MethodsA novel bentonite complex and bentonite clay were provided by C&L Biotech Co., Ltd. (Seoul, Korea). The elements of bentonite clay were analysed using inductively coupled plasma optical emission spectroscopy. Burn wounds were induced on the dorsal skin of two Yucatan minipigs, and tissue regeneration was determined by cell proliferation, angiogenesis, and collagen deposition using immunohistochemistry and Masson's trichrome staining. Anti-in ammatory function was determined using quantitative real-time PCR and enzyme-linked immunosorbent assays.
ResultsWe found that by inducing collagen synthesis, cell proliferation, and angiogenesis, the bentonite complex improved skin regeneration in burn wounds. It was also identi ed that the expression of in ammatory cytokines associated with cyclooxygenase 2 (COX-2) signalling was signi cantly inhibited by treatment of the burn wounds with the bentonite complex. An in vitro study to identify the anti-in ammatory effect of bentonite clay, a major component of the bentonite complex, showed that COX-2 signalling was signi cantly regulated in both HacaT keratinocytes and 3D4/2 macrophage cell lines in vitro.
ConclusionsThis study identi ed the therapeutic effect of a novel bentonite complex in burn wounds by inducing skin regeneration and bentonite-mediated anti-in ammatory responses with bentonite complex treatment.
Surface Texturing is very important process for high cell efficiency in crystalline silicon solar cell. Anisotropic texturing with an alkali etchant was known not to be able to produce uniform surface morphology in multi-crystalline silicon (mc-Si), because of its different etching rate with random crystal orientation. In order to reduce surface reflectance of mc-Si wafer, the general etching tendency was studied with HF/HNO 3 /De-ionized Water acidic solution. And the surface structures of textured mc-Si in various HF/ HNO 3 ratios were compared. The surface morphology and reflectance of textured silicon wafers were measured by FE-SEM and UVvisible spectrophotometer, respectively. We obtained average reflectance of 16~19% for wavelength between 400 nm and 900 nm depending on different etching conditions.
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