We report the demonstration of CW lasing at room temperature in a GaN-based vertical-cavity surface-emitting laser (VCSEL) by current injection. The active region of the VCSEL consisted of a two-pair InGaN/GaN quantum well active layer. The optical cavity consisted of a 7-λ-thick GaN semiconductor layer and an indium tin oxide layer for p-contact embedded between two SiO2/Nb2O5 dielectric distributed Bragg reflectors. The VCSEL was mounted on a Si substrate by wafer bonding and the sapphire substrate was removed by laser lift-off. Under CW operation for an 8-µm aperture device, the threshold current was 7.0 mA and the emission wavelength was approximately 414 nm.
We compared the lasing characteristics of GaN-based vertical-cavity surface-emitting lasers (VCSELs) fabricated using a GaN substrate with those fabricated using a sapphire substrate. The original substrates are removed from the devices after the devices have been bonded to Si substrates. Consequently, with the exception of the cavity length, the two kinds of fabricated VCSELs have almost the same structures. The VCSELs fabricated using a GaN substrate have a higher maximum output power (0.62 mW) and longer lifetimes than those fabricated using a sapphire substrate. Even for the VCSELs fabricated with a GaN substrate, 10-min operation causes their threshold current to increase.
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