Band-edge emission of ZnO at around room temperature was investigated by measuring the temperature dependence of cathodoluminescence spectra at 20–300 K. Undoped crystals grown by a vapor transport method and Al-doped crystals by flux method were employed to elucidate the effect of doping on luminescence properties. For the Al-doped crystals, the free-exciton emission was weak through out the temperature range T<300 K. The most intense emission peak of the Al-doped crystal was energetically close to bound exciton annihilation emission. On the other hand, for undoped crystals, it was found that the most intense emission peak at room temperature was at E≈Eg−60 meV and this peak was not assignable to free-exciton annihilation emission. It was also found that this peak is not a reason for the reduction in emission efficiency.
We have succeeded in pulsed laser annealing of N+ ion-implanted n-type 6H-SiC for increasing the carrier density near surface in order to decrease contact resistance, which induces little redistribution of implanted impurities after laser irradiation. By repeated laser irradiation at low energy density, the ion–implanted impurities were electrically activated without melting the surface region. SiC substrates with impurity concentration of 2×1018 /cm3 were implanted with 30 keV N+ ions with dose of 4.7×1013/cm2. After pulsed laser annealing, a contact resistance was measured to be 5.7×10−5 Ωcm2 using Al electrode on the N+ -implanted layer.
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