Various kinds of high quality optical bers are routinely fabricated by the modi ed chemical vapor deposition (MCVD), in which ne particles are generated through the oxidation of chemical precursor and deposited in a silica tube reactor. Ef ciency, rate, and uniformity of particle deposition determine the quality and cost of optical bers; therefore efforts to enhance aerosol deposition performance should be important for further improving both quality and cost. Here we propose a jet assisted aerosol chemical vapor deposition method utilizing gas jets in the conventional MCVD silica tube reactor for the purpose of enhancing the ef ciency, rate, and uniformity of particle deposition. High temperature helium gas is injected radially through an electrically heated thin tube inserted inside the silica tube. High temperature gas jets push particles generated in a tube toward the tube wall and therefore shorten the axial length of particle trajectories before deposition and cause particles to experience higher thermophoretic force. As a result, deposition ef ciency (and rate) was found to considerably increase compared to the conventional method, and the uniformity was also signi cantly improved.
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