Photoelectrochromic properties of polypyrrole‐coated Si electrodes in propyrene carbonate solutions were investigated to obtain fundamental information on optical image formation. It took about 1s or more for a coated film ca. 90 nm thick to complete its color change when the entire surface of the film was illuminated with a 500W xenon lamp, an observation of which indicates diffusion limitation of electrolyte anions in the film. In contrast, different image forming behaviors were seen when the film was illuminated with a He‐Ne laser. Illumination of the film on n‐type Si substrates with the laser for 1s gave an optical image of about ten times of the illuminated area, while an optical image comparable with the illuminated area was obtained for p‐type Si substrates for the same illumination time. In either case, continuous irradiation caused peripheral growth of the optical image in the film.
Reduction of CO to methanol was achieved with the current efficiency of ca. 10% at p-type GaP photocathodes coated with heat-treated 5,10,15,20-tetraphenylporphyrinatoiron (II).
Until now, metrologists had no statistics-based method to determine the sampling needed for an experiment before the start that accuracy experiment. We show a solution to this problem called inverse total measurement uncertainty (TMU) analysis, by presenting statistically based equations that allow the user to estimate the needed sampling after providing appropriate inputs, allowing him to make important "risk versus reward" sampling, cost, and equipment decisions. Application examples using experimental data from scatterometry and critical dimension scanning electron microscope tools are used first to demonstrate how the inverse TMU analysis methodology can be used to make intelligent sampling decisions and then to reveal why low sampling can lead to unstable and misleading results. One model is developed that can help experimenters minimize sampling costs. A second cost model reveals the inadequacy of some current sampling practices-and the enormous costs associated with sampling that provides reasonable levels of certainty in the result. We introduce the strategies on how to manage and mitigate these costs and begin the discussion on how fabs are able to manufacture devices using minimal reference sampling when qualifying metrology steps. Finally, the relationship between inverse TMU analysis and hybrid metrology is explored. Sendelbach et al.: Effect of measurement error budgets and hybrid metrology. . . Downloaded From: http://nanolithography.spiedigitallibrary.org/ on 05/14/2015 Terms of Use: http://spiedl.org/terms
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