Self-assembled nanodrill technology based on droplet epitaxy growth was developed to obtain nanoholes on a GaAs(100) surface. In this technology, the gallium droplets act like “electrochemical drills” etching away the GaAs substrate beneath to give rise to nanoholes more than 10nm deep. The driving force of the nanodrill is attributed to the arsenic desorption underneath the gallium droplet at high growth temperatures and Ga-rich condition. This nanodrill technology provides an easy and flexible method to fabricate nanohole templates on GaAs(100) surface and has great potential for developing quantum dots and quantum dot molecules for quantum computation applications.

We report a 50% increase in the power conversion efficiency of InAs/GaAs quantum dot solar cells due to n-doping of the interdot space. The n-doped device was compared with GaAs reference cell, undoped, and p-doped devices. We found that the quantum dots with built-in charge (Q-BIC) enhance electron intersubband quantum dot transitions, suppress fast electron capture processes, and preclude deterioration of the open circuit voltage in the n-doped structures. These factors lead to enhanced harvesting and efficient conversion of IR energy in the Q-BIC solar cells.

A growth technique combining droplet epitaxy and molecular beam epitaxy (MBE) is developed to obtain a low density of InAs quantum dots (QDs) on GaAs nanoholes. This growth technique is simple, flexible, and does not require additional substrate processing. It makes possible separate control of the QD density via droplet epitaxy and the QD quality via MBE growth. In this letter the authors report the use of this technique to produce InAs QDs with a low density of 2.7×108cm−2 as well as good photoluminescence properties. The resulting samples are suitable for single QD device fabrication and applications.

High-performance, multispectral, and large-format infrared focal plane arrays are the long-demanded third-generation infrared technique for hyperspectral imaging, infrared spectroscopy, and target identification. A promising solution is to monolithically integrate infrared photodetectors on a silicon platform, which offers not only low-cost but high-resolution focal plane arrays by taking advantage of the well-established Si-based readout integrated circuits. Here, we report the first InAs/GaAs quantum dot (QD) infrared photodetectors monolithically integrated on silicon substrates by molecular beam epitaxy. The III–V photodetectors are directly grown on silicon substrates by using a GaAs buffer, which reduces the threading dislocation density to ∼106 cm–2. The high-quality QDs grown on Si substrates have led to long photocarrier relaxation time and low dark current density. Mid-infrared photodetection up to ∼8 μm is also achieved at 80 K. This work demonstrates that III–V photodetectors can directly be integrated with silicon readout circuitry for realizing large-format focal plane arrays as well as mid-infrared photonics in silicon.

No abstract