No abstract

Rumex crispus L. (R. crispus) is regarded as an aromatic plant. It was used for its excellent biological properties in traditional medicine. The aerial part was extracted successively by maceration with three solvents increasing polarity (cyclohexane (CYH), dichloromethane (DCM), and methanol (MeOH)) to evaluate their chemical compositions and biological activities. The extracts were rich in phenolic compounds (13.0 to 249.8 mg GAE/g of dry weight (dw)). The MeOH extract has presented remarkable IC50 = 6.2 μg/mL for anti-DPPH and 31.6 μg/mL for anti-AChE. However, the DCM extract has the highest cytotoxic activity against the two cancer cells (HCT-116 and MCF-7) (69.2 and 77.2% inhibition at 50 μg/mL, respectively). Interestingly, GC-MS analysis enabled to identify three new compounds in R. crispus extracts, such as L-(−)-arabitol (5), D-(−) fructopyranose (7) detected only in MeOH extract, and 2, 5-dihydroxyacetophenone (3) detected in all extracts. For HPLC chromatograms, cardamonin (8), 5-hydroxy-3′-methoxyflavone (17), and 3′-hydroxy-b-naphthoflavone (18) showed the highest concentrations of 74.0, 55.5, and 50.4 mg/g of dw, respectively, among others who are identified. Some phenolic compounds were identified and quantified by HPLC in more than one organic extract, such as 4′, 5-dihydroxy-7-methoxyflavone (13), 4′, 5-dihydroxy-7-methoxyflavone (14), 5-hydroxy-3′-methoxyflavone (17), and 3′-hydroxy-b-naphthoflavone (18), were found for the first time in the R. crispus extracts. Our results showed that the biological activities of this plant might be linked to their phenolic compounds and that the polar extracts could be considered as new natural supplements to be used in food and pharmaceuticals.

In this work, we present the electrochemical deposition of manganese dioxide (MnO2) thin films on carbon-coated TiN/Si micro-pillars. The carbon buffer layer, grown by plasma enhanced chemical vapor deposition (PECVD), is used as a protective coating for the underlying TiN current collector from oxidation, during the film deposition, while improving the electrical conductivity of the stack. A conformal electrolytic MnO2 (EMD) coating is successfully achieved on high aspect ratio C/TiN/Si pillar arrays by tailoring the deposition process. Lithiation/Delithiation cycling tests have been performed. Reversible insertion and extraction of Li+ through EMD structure are observed. The fabricated stack is thus considered as a good candidate not only for 3D micorbatteries but also for other energy storage applications.

Tin sulfide (SnS) thin films have been deposited onto glass substrates using triphenylphosphine sulfide (Ph 3 PS) as a sulfur precursor in a chemical vapor deposition reactor in a temperature range of 250 °C-400 °C. The influence of the sulphidisation temperature in the crystal structure, surface morphology, chemical composition and optical properties has been investigated. X-ray diffraction, energy dispersive analysis of x-rays, and Raman spectroscopy showed that pure SnS thin films have been successfully obtained at 250 °C. All the deposited films were polycrystalline and showed orthorhombic structure, with a preferential orientation according to the direction 〈111〉. The optical measurements showed that the films deposited exhibited a direct allowed transition and have a relatively high absorption coefficient. The presence of mixed tin sulfide phases granted by the variation of the sulphidisation temperature has affected the optical properties of the deposited films. The refractive index (n) and extinction coefficient (k ), has low values compared to conventional semiconductor materials. The grown films can be considered as a good light absorbing material and a promising candidate for application in optoelectronic devices.