Among several double patterning methods, Litho-Etch-Litho-Etch type DPT is known to have an advantage of layout flexibility. There are two problems when a hotspot, which is not fixable by tuning OPC, is detected on a wafer or during lithography compliance verification. One is to redo decomposition, OPC and verification is quite time consuming. The other is a risk to introduce a new hotspot at different locations. In this report, a new method to fix hotspot with layout modification of limited area will be presented. The proposed method can reduce not only repair turnaround time but also a risk of new hotspot generation.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.