A helical surface relief can be created in an azo-polymer film simply by illuminating circularly polarized light with spin angular momentum and without any orbital angular momentum. The helicity of the surface relief is determined by the sign of the spin angular momentum. The illumination of circularly polarized light induces orbital motion of the azo-polymer to shape the helical surface relief as an intermediate form; a subsequent transformation to a non-helical bump-shaped relief with a central peak creates a final form with additional exposure time. The mechanism for the formation of such a helical surface relief was also theoretically analyzed using the formula for the optical radiation force in a homogeneous and isotropic material.
An optical vortex with orbital angular momentum (OAM) can be used to induce microscale chiral structures in various materials. Such chiral structures enable the generation of a nearfield vortex, i.e. nearfield OAM light on a sub-wavelength scale, thereby leading to further nanoscale mass-transport. We report on the formation of a nanoscale chiral surface relief in azo-polymers due to nearfield OAM light. The resulting nanoscale chiral relief exhibits a diameter of ca. 400 nm, which corresponds to less than 1/5-1/6th of the original chiral structure (ca. 2.1 µm). Such a nanoscale chiral surface relief is established by the simple irradiation of uniform visible plane-wave light with an intensity of <500 mW/cm.
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