InGaAs triangular barrier (TB) structures of various barrier thicknesses have been formed on InP substrates. With them, we have fabricated TB photodiodes that yield a very high responsivity of 2.3 × 104 A/W at 100 K for the 1312 nm light of 320 fW power. By passivating the diode surface with polyimide, the dark current has been markedly reduced. Diodes with thicker barriers show higher sensitivity and responsivity, reflecting the enhancement of the barrier lowering effect by photogenerated holes.
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